Spin-Rinse-Dryer (SRD)

Description:
The SRD is designed to provide DI rinsing and Nitrogen drying of silicon wafers that are streak and spot free.  Surface contaminants that reside on the wafers are flushed away in the DI rinse stream.  There are two modes available for SRD operation.  Mode #1 or "manual mode" will allow the DI rinse and dry cycles to run until a preset amount of time has passed for each cycle.  Mode #2 or "auto mode" will allow the DI rinse cycle to run until a preset DI resistivity level is reached after which the dry cycle will start.  The auto cycle will usually substantially increase the amount of time the rinse cycle will take place.

Manufacturer: Semitool
Model: ST-460
Operation Procedure
Qualified Users List