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Thermal Evaporator
Description:
The thermal evaporator uses resistive energy
to evaporate thin films onto a given
substrate. It can deposit materials with a
specified thickness of up to 1500
nanometers. The thickness is controlled by
the use of a quartz crystal monitor.
Three 8" wafers can be processed
simultaneously and tooling is being
developed for additional sizes. Up to three
different layers may be evaporated in one
run.
Manufacturer: CHA
Model:
Operation Procedure
Qualified Users List
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