DRIE Etcher
Manufacturer: Oxford Instruments
Model: Plasma Lab System 100
Description: Reactive ion etching (RIE) using fluorine based gases. 100mm tooling with load lock.
Operation Procedure
List of process capabilities
- BOSCH etch
- Silicon Nitride Etch (Si3N4)
- Silicon Cryo-etch (Si)
- Silicon Dioxide Etch (SiO2)
- Metal Etch