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Oxford PlasmaLab System 100


Manufacturer: Oxford Instruments
Model:  PlasmaLab System 100

Description:
 Reactive ion etching (RIE) using fluorine based gases. 100mm tooling with load lock.

List of process capabilities

  • BOSCH etch
  • Silicon Nitride Etch (Si3N4)
  • Silicon Cryo-etch (Si)
  • Silicon Dioxide Etch (SiO2)
  • Metal Etch