Research Areas
Gate Oxide Studies
The oxide reliability team uses state of the art semiconductor characterization equipment to assess the reliability of the gate dielectric in cutting edge semiconductor devices, from both Silicon (SiO2) and High-K (HfO2) material systems. We are particularly interested in carrier transport mechanisms in High-K dielectrics. We are also researching the effects of dielectric breakdown of simple complementary MOS (CMOS) logic circuits, such as inverters and NAND gates.
Biomaterials Research
The biomaterials team is conducting research in several areas including engineering nanostructures using DNA, investigating the nanomechanical properties of biomaterials using scanning probe microscopy, and molecular electronics.
Electronic Materials Related Research
A Study of the Solution-Based Synthesis of N-Doped ZnO, Mn- and Co-Doped ZnO, and (N,Mn)- and (N,Co)-Codoped ZnO, this joint proposal with Northwest Nazarene University, Boise State University, and Rochester Institute of Technology seeks a solution-based route to zinc oxide containing magnetic elements.
Through-Wafer Interconnects
We are developing polymer and biological sensors using 3D and electron beam lithography fabrication techniques.