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               Dr. Kris Campbell received a B.S. in electrical engineering from the University of Nevada, Las Vegas.  As an undergraduate student, she worked as a technical writer for Science Applications International Corporation and as an engineer-in-training at EG&G Energy Measurements.  After obtaining a B.S.E.E., she accepted an engineering position at EG&G where she designed high bandwidth electro-optics systems.  She later joined EG&G Idaho at the Idaho National Engineering Laboratory (INEL).  At the INEL she became interested in physical chemistry and specifically in chemical systems that could be used for hazardous waste treatment.  This interest took her to graduate school at the University of California, Davis. 

Dr. Campbell received her Ph.D. from UC Davis.  She was awarded the ‘Outstanding Ph.D. Dissertation Award’ by the Department of Chemistry at UC Davis. 

Upon graduation, Dr. Campbell was offered a position at Micron Technology, Inc. in Boise, ID to work on new memory technologies.  As a senior engineer at Micron, she was appointed as a Senior Technical Member in the Micron Technical Career Ladder program.  She has over 100 pending/issued patents in the area of chalcogenide materials as used in ion-conducting memory.  While working at Micron, Dr. Campbell joined Boise State University as an adjunct faculty in the Department of Chemistry.  She taught general chemistry, general chemistry laboratory, and introduction to chemistry for the life sciences laboratory.

Dr. Campbell was selected to join Boise State University as an associate professor with a joint appointment in the Departments of Electrical and Computer Engineering and Materials Science and Engineering starting in the Fall of 2005.  In addition to her numerous patents, she has published over 20 papers in peer reviewed journals, 2 book chapters, and several conference proceedings. 

Dr. Campbell’s current research interests are focused in the areas of chalcogenide glasses and new electronic memory technologies based on ion-conduction and electron spin zero-field splitting.   She is a member of Sigma Xi, the IEEE, the Society of Women Engineers, and the American Chemical Society.